Deep level defects in n-type GaAsBi and GaAs grown at low temperatures, P.M. Mooney, K.P. Watkins, Zenan Jiang, A.F. Basile, R.B. Lewis, V. Bahrami-Yekta, M. Masnadi-Shirazi, D.A. Beaton, T. Tiedje, J. Appl. Phys. 113, 113708, (2013)

Deep level defects in n-type GaAs_1-xBi_x having 0 < x < 0.012 and GaAs grown by molecular beam epitaxy (MBE) at substrate temperatures between 300 and 400  C have been investigated by Deep Level Capacitance Spectroscopy. Incorporating Bi suppresses the formation of an electron trap with activation energy 0.40 eV, thus reducing the total trap concentration in dilute GaAsBi layers by more than a factor of 20 compared to GaAs grown under the same conditions. We find that the dominant traps in dilute GaAsBi layers are defect complexes involving As_Ga, as expected for MBE growth at these temperatures.